An assessment of the resolution limitation due to radiation-damage in X-ray diffraction microscopy

著者: Malcolm R. Howells, Tobias Beetz, Henry N. Chapman, Chuan Cui, James M. Holton, Chris Jacobsen, Janos Kirz, Enju Lima, Stefano Marchesini, Houxun Miao, D. Sayre, David A. Shapiro, John C. H. Spence, D. Starodub - Journal of Electron Spectroscopy and Related Phenomena 2008 被引用: 517