BE-PLUS: a new base editing tool with broadened editing window and enhanced fidelity

著者: Wen G. Jiang, Songjie Feng, Shisheng Huang, Wenxia Yu, Guanglei Li, Guang Yang, Yajing Liu, Yu Zhang, Lei Zhang, Yu Hou, Jia Chen, Jieping Chen, Xingxu Huang, Jieping Chen, Xingxu Huang - Cell Research 2018 被引用: 124